Coating processes – Coating by vapor – gas – or smoke
Reexamination Certificate
2011-03-01
2011-03-01
Meeks, Timothy H (Department: 1715)
Coating processes
Coating by vapor, gas, or smoke
C427S569000, C427S255290
Reexamination Certificate
active
07897208
ABSTRACT:
The present invention generally comprises a silicon dioxide atomic layer deposition method. By providing pyridine as a catalyst, water may be utilized as the oxidization source while depositing at a low temperature. Prior to exposing the substrate to the water, the substrate may be exposed to a pyridine soak process. Additionally, the water may be co-flowed to the chamber with the pyridine through separate conduits to reduce interaction prior to entering the chamber. Alternatively, the pyridine may be co-flowed with a silicon precursor that does not react with pyridine.
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Huang Yi-Chiau
Mahajani Maitreyee
McDougall Brendan
Applied Materials Inc.
Gambetta Kelly M
Meeks Timothy H
Patterson & Sheridan LLP
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