Low profile substrate ground probe

Details Low profile substrate ground probe Low profile substrate ground probe

1996-09-10

1998-12-01

Chapman, Mark

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430 5, 2504911, 269286, 269903, G03C 500

Patent

active

058436235

ABSTRACT:
According to the preferred embodiment, the invention is a simplified, low profile, adjustable substrate ground probe used in electron beam photolithography processing. The low profile substrate ground probe is compatible with state-of-the-art, electron beam lithographic processing tools that require minimal clearance. The ground contact base incorporates a flexure, an adjustable ground contact base, and an adjustment screw which allows the height of the ground contact relative to the surface of the workpiece to be accurately and easily set, without using shims. The flexure is a one-piece probe body with a flame sprayed tungsten carbide ground contact surface.

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patent: 4189230 (1980-02-01), Zasio
patent: 4323638 (1982-04-01), Adams et al.
patent: 4412133 (1983-10-01), Eckes et al.
patent: 4642438 (1987-02-01), Beumer et al.
patent: 4992661 (1991-02-01), Tamura et al.
patent: 5357116 (1994-10-01), Talbot et al.

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