Low outgassing and non-crosslinking series of polymers for...

Details Low outgassing and non-crosslinking series of polymers for... Low outgassing and non-crosslinking series of polymers for...

2003-12-30

2008-10-28

Walke, Amanda C. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S312000, C430S214000

Reexamination Certificate

active

07442487

ABSTRACT:
A series structure of a chemically amplified negative tone photoresist that is not based on cross-linking chemistry is herein described. The photoresist may comprise: a first aromatic structure copolymerized with a cycloolefin, wherein the cycloolefin is functionalized with a di-ol. The photoresist may also include a photo acid generator (PAG). When at least a portion of the negative tone photoresist is exposed to light (EUV or UV radiation), the PAG releases an acid, which reacts with the functionalized di-ol to rearrange into a ketone or aldehyde. Then new ketone or aldehyde is less soluble in developer solution, resulting in a negative tone photoresist.

REFERENCES:
patent: 4767500 (1988-08-01), Patt et al.
patent: 5336815 (1994-08-01), Becker et al.
patent: 6136499 (2000-10-01), Goodall et al.
patent: 6359153 (2002-03-01), Lee et al.
patent: 6369143 (2002-04-01), Park et al.
patent: 6391518 (2002-05-01), Jung et al.
patent: 6437052 (2002-08-01), Iwasa et al.
patent: 6548219 (2003-04-01), Ito et al.
patent: 6607867 (2003-08-01), Kim et al.
patent: 6790587 (2004-09-01), Feiring et al.
patent: 6800418 (2004-10-01), Yoon et al.
patent: 6884564 (2005-04-01), Feiring et al.
patent: 2002/0016431 (2002-02-01), Iwasa et al.
patent: 2002/0042549 (2002-04-01), Holdstock et al.
patent: 2002/0058199 (2002-05-01), Zampini et al.
patent: 2002/0102490 (2002-08-01), Ito et al.
patent: 2002/0146638 (2002-10-01), Ito et al.
patent: 2003/0027076 (2003-02-01), Szmanda
patent: 2003/0175620 (2003-09-01), Toishi et al.
patent: 2003/0176583 (2003-09-01), Rhodes et al.
patent: 2003/0219678 (2003-11-01), Harada et al.
patent: 2004/0023152 (2004-02-01), Feiring et al.
patent: 2004/0033436 (2004-02-01), Berger et al.
patent: 2004/0137360 (2004-07-01), Berger et al.
patent: 2004/0192867 (2004-09-01), Narita et al.
patent: 2004/0229157 (2004-11-01), Rhodes et al.
patent: 2005/0037289 (2005-02-01), Carr et al.
patent: 1126322 (2001-08-01), None
patent: 11143067 (1999-05-01), None
patent: WO 2005/066715 (2005-07-01), None
English language abstract fo JP 11-143067.
Cho Sungseo, et al.,“Negitive Tone 193nm Resists”; Proc SPIE Int Opt Eng; Advances in Resist Technology and Processing XVII; Santa Clara, CA., USA; vol. 3999; 2000; XP002345992; pp. 62-73.
Sooriyakumaran, R., et al.; “Acid-catalyzed Pinacol Rearrangement, Chemically Amplified Reverse Polarity Change”; Proc SPIE Int Soc Opt Eng; Advances in Resist Technology and Processing VIII; San Jose, CA, USA; vol. 1466; 1991; XP002345993; pp. 419-428.
International Search Report and Written Opinion; International Application No. PCT/US2004/043684; Date of mailing: Oct. 14, 2005, pp. 1-11.
International Preliminary Report on Patentability; International Application No. PCT/US2004/043684; Date of mailing: Jul. 13, 2006, pp. 1-7.

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