Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
Patent
1999-03-23
2000-02-22
Kunemund, Robert
Semiconductor device manufacturing: process
Chemical etching
Combined with coating step
438695, 438696, H01L 21311
Patent
active
060280077
ABSTRACT:
The invention relates to a method for producing low cost hermetic Integrated Module Assembly (IMA) packaging, where an aluminum coating (24) is deposited on a poly-tetrafluoral-ethaline substrate (20), the aluminum coating (24) is selectively etched to form a waveguide window (26) and the substrate (20) is selectively treated over the waveguide window (26) to produce a non-conductive hermetic seal. The substrate (20) is then joined to a metal carrier (28) containing the waveguide (30). As a result of using selectively treated low cost substrates to produce hermetic seals, more expensive substrates are not required to form hermetic seals over substrate to waveguide interconnections.
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patent: 5433260 (1995-07-01), Taylor
Chan Steven S.
Dowsing, III John E.
Snodgress Jason E.
Kunemund Robert
Perez-Ramos Vanessa
TRW Inc.
Yatsko Michael S.
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