Load lock design for rapid wafer heating

Semiconductor device manufacturing: process – Miscellaneous

Reexamination Certificate

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C118S640000

Reexamination Certificate

active

07960297

ABSTRACT:
A semiconductor processing tool heats wafers using radiant heat and resistive heat in chamber or in a load lock where pressure changes. The wafers are heated in greater part with a resistive heat source until a transition temperature or pressure is reached, then they are heated in greater part with a radiant heat source. Throughput improves for the tool because of the wafers can reach a high temperature uniformly in seconds.

REFERENCES:
patent: 3612825 (1971-10-01), Chase et al.
patent: 4457359 (1984-07-01), Holden
patent: 4535835 (1985-08-01), Holden
patent: 4563589 (1986-01-01), Scheffer
patent: 5113929 (1992-05-01), Nakagawa et al.
patent: 5178682 (1993-01-01), Tsukamoto et al.
patent: 5228208 (1993-07-01), White et al.
patent: 5282121 (1994-01-01), Bornhorst et al.
patent: 5447431 (1995-09-01), Muka
patent: 5558717 (1996-09-01), Zhao et al.
patent: 5588827 (1996-12-01), Muka
patent: 5811762 (1998-09-01), Tseng
patent: 6072163 (2000-06-01), Armstrong et al.
patent: 6087632 (2000-07-01), Mizosaki et al.
patent: 6200634 (2001-03-01), Johnsgard et al.
patent: 6214184 (2001-04-01), Chien et al.
patent: 6228438 (2001-05-01), Schmitt
patent: 6307184 (2001-10-01), Womack et al.
patent: 6394797 (2002-05-01), Sugaya et al.
patent: 6413321 (2002-07-01), Kim et al.
patent: 6467491 (2002-10-01), Sugiura et al.
patent: 6559424 (2003-05-01), O'Carroll et al.
patent: 6563092 (2003-05-01), Shrinivasan et al.
patent: 6639189 (2003-10-01), Ramanan et al.
patent: 6860965 (2005-03-01), Stevens
patent: 6895179 (2005-05-01), Kanno
patent: 6899765 (2005-05-01), Krivts et al.
patent: 7105463 (2006-09-01), Kurita et al.
patent: 7138606 (2006-11-01), Kanno et al.
patent: 7253125 (2007-08-01), Bandyopadhyay et al.
patent: 7265061 (2007-09-01), Cho et al.
patent: 7327948 (2008-02-01), Shrinivasan et al.
patent: 7410355 (2008-08-01), Granneman et al.
patent: 7665951 (2010-02-01), Kurita et al.
patent: 7845891 (2010-12-01), Lee et al.
patent: 2002/0117109 (2002-08-01), Hazelton et al.
patent: 2002/0162630 (2002-11-01), Satoh et al.
patent: 2003/0013280 (2003-01-01), Yamanaka
patent: 2003/0113187 (2003-06-01), Lei et al.
patent: 2004/0023513 (2004-02-01), Aoyama et al.
patent: 2004/0060917 (2004-04-01), Liu et al.
patent: 2004/0183226 (2004-09-01), Newell et al.
patent: 2004/0187790 (2004-09-01), Bader et al.
patent: 2005/0045616 (2005-03-01), Ishihara
patent: 2005/0258164 (2005-11-01), Hiramatsu et al.
patent: 2006/0018639 (2006-01-01), Ramamurthy et al.
patent: 2006/0081186 (2006-04-01), Shinriki et al.
patent: 2007/0107845 (2007-05-01), Ishizawa et al.
patent: 2007/0205788 (2007-09-01), Natsuhara et al.
patent: 2007/0243057 (2007-10-01), Shimada et al.
patent: 2009/0060480 (2009-03-01), Herchen
patent: 2009/0277472 (2009-11-01), Rivkin et al.
patent: 2010/0270004 (2010-10-01), Landess et al.
patent: 01-107519 (1989-04-01), None
patent: 06/037054 (1994-02-01), None
patent: 07/147274 (1995-06-01), None
patent: 09-092615 (1997-04-01), None
patent: 2005/116655 (2005-04-01), None
patent: 2003/0096732 (2003-12-01), None
patent: 02/11911 (2002-02-01), None
U.S. Office Action mailed Oct. 3, 2007, from U.S. Appl. No. 11/115,576.
U.S. Final Office Action mailed May 2, 2008, from U.S. Appl. No. 11/115,576.
U.S. Office Action mailed Oct. 17, 2008, from U.S. Appl. No. 11/115,576.
Shrinivasan et al., “Pedestal Heat Transfer and Temperature Control,” Novellus Systems, Inc., U.S. Appl. No. 11/851,310, filed Sep. 6, 2007.
Doble et al., “Concave Pedestal for Uniform Heating of Silicon Wafers,” Novellus Systems, Inc., U.S. Appl. No. 11/546,189, filed Oct. 10, 2006.
Landess et al., “Tailored Profile Pedestal for Therm-Elastically Stable Cooling or Heating of Substrates,” Novellus Systems, Inc., U.S. Appl. No. 11/129,266, filed May 12, 2005, pp. 1-25.
U.S. Office Action mailed Jun. 16, 2008, from U.S. Appl. No. 11/546,189.
U.S.Final Office Action mailed Oct. 16, 2008, from U.S. Appl. No. 11/546,189.
U.S. Office Action mailed Jul. 18, 2006, from U.S. Appl. No. 11/184,101.
Notice of Allowance and Fee Due mailed Jan. 25, 2007, from U.S. Appl. No. 11/184,101.
Allowed Claims from U.S. Appl. No. 11/184,101.
Nordin et al., “Closed Loop Temperature Heat Up and Control Utilizing Wafer-To-Heater Pedestal Gap Modulation,” Novellus Systems, Inc., U.S. Appl. No. 11/937,364, filed Nov. 8, 2007.
Gage et al., “Transferring Heat in Loadlocks,” Novellus Systems, Inc., U.S. Appl. No. 12/140,196, filed Jun. 16, 2008.
Rivkin et al., “Photoresist Stripping Method and Apparatus,” Novellus Systems, Inc., U.S. Appl. No. 61/050,880, filed May 6, 2008.
Gage et al., “Minimum Contact Area Wafer Clamping with Gas Flow for Rapid Wafer Cooling,” Novellus Systems, Inc., U.S. Appl. No. 12/333,239, filed Dec. 11, 2008.
Cho et al., “Method and Apparatus for UV Exposure of Low Dielectric Constant Materials for Porogen Removal and Improved Mechanical Properties”, Novellus Systems, Inc., U.S. Appl. No. 10/800,377, filed Mar. 11, 2004, pp. 1-31.
Varadarajan et al., “Tensile Dielectric Films Using UV Curing”, Novellus Systems, Inc., U.S. Appl. No. 10/972,084, filed Oct. 22, 2004.
Shrinivasan et al., “Single-Chamber Sequential Curing of Semiconductor Wafers,” Novellus Systems, Inc., U.S. Appl. No. 11/115,576, filed Apr. 26, 2005, pp. 1-30.
Shrinivasan et al., “Cast Pedestal with Heating Element and Coaxial Heat Exchanger,” Novellus Systems, Inc., U.S. Appl. No. 11/184,101, filed Jul. 18, 2005, pp. 1-30.
Kamian et al., “Ultraviolet Light Treatment Load Lock for Dielectric Films,” Novellus Systems, Inc., U.S. Appl. No. 11/561,834, filed Nov. 20, 2006, pp. 1-25.
U.S. Appl. No. 11/937,364, Office Action mailed Apr. 9, 2010.
U.S. Appl. No. 11/115,576, Office Action mailed Apr. 22, 2009.
U.S. Appl. No. 11/115,576, Office Action mailed Apr. 15, 2010.
U.S. Appl. No. 11/129,266, “Tailored profile pedestal for thermo-elastically stable cooling for heating of substrates”, Landess et al., filed May 12, 2005.
U.S. Appl. No. 11/129,266, Office Action mailed Feb. 20, 2009.
U.S. Appl. No. 11/129,266, Office Action mailed Oct. 28, 2009.
U.S. Appl. No. 12/749,170, “Tailored profile pedestal for thermo-elastically stable cooling or heating of substrates”, Landess et al., filed Mar. 29, 2010.
U.S. Appl. No. 11/751,584, “Cast pedestal with heating element on coaxial heat exchanger”, Shrinivasan et al., filed May 21, 2007.
U.S. Appl. No. 11/851,310, Office Action mailed Jun. 8, 2010.
U.S. Appl. No. 12/341,943, “Atomic layer removal for high aspect ratio gapfill”, van Schravendijk et al., filed Dec. 22, 2008.
U.S. Appl. No. 61/122,308, “Conductively cooled process for wide temperature range processes”, Nieh et al., filed Dec. 12, 2008.
U.S. Appl. No. 12/435,890, “Photoresist stripping method and apparatus”, Rivkin et al., filed May 5, 2009.
U.S. Appl. No. 12/341,943, Office Action mailed Jun. 11, 2010.
International Search Report and Written Opinion for application No. PCT/US2009/067040, mailed Aug. 2, 2010.
U.S. Appl. No. 12/341,943, Office Action mailed Dec. 23, 2010.
U.S. Appl. No. 12/333,239, Final Office Action mailed Dec. 27, 2010.
Notice of Allowance for U.S. Appl. No. 11/851,310, mailed Jan. 5, 2011.
Allowed Claims for U.S. Appl. No. 11/851,310, as of mailed Jan. 5, 2011.
U.S. Appl. No. 11/937,364, Final Office Action mailed Dec. 27, 2010.

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