Lithography process

Details Lithography process Lithography process

1993-02-09

2000-08-22

Werner, Laura S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430326, 430331, G03C 500

Patent

active

061070076

ABSTRACT:
A lithography process for forming a pattern having different sizes or different shapes of pattern components, comprises steps of exposing a resist to a predetermined light pattern by modified illumination, and removing, at least one step of forming the resist pattern, a region of the resist by employing a lithography-developing solution containing a surfactant, the surfactant being capable of promoting dissolution of a smaller pattern component to be removed of the resist.
The surfactant is represented by the general formula below:

REFERENCES:
patent: 4395480 (1983-07-01), Sprintschnik
patent: 4914006 (1990-04-01), Kato et al.
patent: 5030550 (1991-07-01), Kawabe et al.
patent: 5055374 (1991-10-01), Seio et al.
"Some observations of the effects of partial coherence on projection system imagery" by G. C. Dente et al.; Optical Engineering;Nov. Dec., 1983; vol. 22, No. 6. pp. 720-724.

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