Lithography apparatus for manufacture of integrated circuits

Details Lithography apparatus for manufacture of integrated circuits Lithography apparatus for manufacture of integrated circuits

2004-04-16

2009-08-25

Duda, Kathleen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S322000

Reexamination Certificate

active

07579135

ABSTRACT:
An immersion lithographic system10comprises an optical surface51, an immersion fluid60contacting at least a portion of the optical surface, and a semiconductor structure80having a topmost photoresist layer70having a thickness of less than about 5000 angstroms, wherein a portion of the photoresist is in contact with the immersion fluid. Further, a method for illuminating a semiconductor structure80having a topmost photoresist layer70with a thickness of less than about 5000 angstroms, comprising introducing an immersion fluid60into a space between an optical surface51and the photoresist layer, and directing light preferably with a wavelength of less than about 450 nm through the immersion fluid and onto the photoresist.

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