Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging
Reexamination Certificate
1998-11-05
2001-10-30
Duda, Kathleen (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Electron beam imaging
C430S311000
Reexamination Certificate
active
06309798
ABSTRACT:
The present invention relates to a novel lithographic method by which arbitrary nanometer-sized structures can be generated on surfaces with particular ease. In particular, it relates to the writing of patterns, i.e., of nanometer-sized lines or dots consisting of metals or metal alloys.
REFERENCES:
patent: 2337892 (1977-08-01), None
patent: 94 11787 (1994-05-01), None
Gross et al., “Ion-beam direct-write mechanisms in palladium acetate films”, Journal of Applied Physics, pp. 1403-1410, Aug. 1989.*
IBM TDB, vol. 31, No. 8, 1989, pp. 347-348, XP002038177.
Dumpich Günter
Lohau Jens
Reetz Manfred T.
Winter Martin
Duda Kathleen
Norris & McLaughlin & Marcus
Studiengesellschaft Kohle MBH
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