Lithographic electron-beam exposure apparatus and methods

Details Lithographic electron-beam exposure apparatus and methods Lithographic electron-beam exposure apparatus and methods

1993-04-28

1995-10-03

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

25049222, 250396R, H01J 3730

Patent

active

054554276

ABSTRACT:
An apparatus for exposing a radiation sensitive workpiece to define patterns therein includes an electron gun, a mask with spaced apertures for passing electron radiation, and a radiation deflector-blanker to direct the radiation to selected ones of the apertures and to form separate beamlets from the apertures then demagnify the separate beamlets and direct them onto the workpiece without crossing them. In one embodiment, the groups of apertures are fixed on the mask and define fixed undivided profiles in the path of the radiation.

REFERENCES:
patent: 4153843 (1979-05-01), Pease
patent: 5051556 (1991-09-01), Sakamoto et al.
patent: 5130547 (1992-07-01), Sakamoto et al.
patent: 5153441 (1992-10-01), Moriizumi

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