Lithographic apparatus and device manufacturing method with...

Details Lithographic apparatus and device manufacturing method with... Lithographic apparatus and device manufacturing method with...

2008-06-18

2010-10-26

Punnoose, Roy (Department: 2886)

Optics: measuring and testing

Shape or surface configuration

By specular reflection

Reexamination Certificate

active

07821650

ABSTRACT:
In a device manufacturing method and a metrology apparatus, metrology measurements are executed using radiation having a first wavelength. Subsequently a grid of conducting material is applied on the substrate, the grid having grid openings which in a first direction in the plane of the grid are smaller than the first wavelength. The space in the scribe lane where the measurement target was, is now shielded and may be used again in further layers or processing steps of the substrate.

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Non-Final Rejection mailed Apr. 17, 2008 for U.S. Appl. No. 11/384,836, filed Mar. 21, 2006, 6 pgs.
Notice of Allowance mailed Oct. 8, 2008 for U.S. Appl. No. 11/384,836, filed Mar. 21, 2006, 6 pgs.

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