Optics: measuring and testing – Shape or surface configuration – By specular reflection
Reexamination Certificate
2006-03-21
2009-02-03
Punnoose, Roy M (Department: 2886)
Optics: measuring and testing
Shape or surface configuration
By specular reflection
Reexamination Certificate
active
07486408
ABSTRACT:
In a device manufacturing method and lithographic apparatus wherein a pattern is transferred from a patterning device onto a substrate, a measurement target is provided on the substrate in a process enabling execution of a substrate measurement using radiation of a first wavelength. Subsequently the measurement target is transformed in a grid of conducting material, the grid having grid openings which are smaller than the first wavelength. The space in the scribe lane where the measurement target was, is now shielded and may be used again in further layers or processing steps of the substrate.
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Van der Schaar et al., “Lithographic Apparatus and Device Manufacturing Method with Reduced Scribe Lane Usage for Substrate Measurement”, U.S. Appl. No. 12/141,640, filed Jun. 18, 2008.
Den Boef Arie Jeffrey
Mos Everhardus Cornelis
Van Der Schaar Maurits
Van Haren Richard Johannes Franciscus
ASML Netherlands B.V.
Punnoose Roy M
Sterne Kessler Goldstein & Fox P.L.L.C.
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