Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate
2006-10-10
2009-12-08
Porta, David P (Department: 2884)
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
C250S493100, C378S034000
Reexamination Certificate
active
07629594
ABSTRACT:
A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.
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International Search Report for International Application No. PCT/NL2007/050469 mailed Jan. 15, 2009, 5 pgs.
Wilhelmus Van Herpen et al., “Lithographic Apparatus, and Device Manufacturing Method”, U.S. Appl. No. 12/405,831, filed Mar. 17, 2009.
Banine Vadim Yevgenyevich
De Kuster Johannes Peterus Henricus
Gielissen Kurt
Moors Johannes Hubertus Josephina
Sidelnikov Yurii Victorovitch
ASML Netherlands B.V.
Gaworecki Mark R
Porta David P
Sterne Kessler Goldstein & Fox P.L.L.C.
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