Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2005-12-28

2008-12-23

Nguyen, Hung Henry (Department: 2851)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S50400H, C355S030000

Reexamination Certificate

active

07468521

ABSTRACT:
A lithographic apparatus includes a radiation system for providing a beam of radiation. The radiation system includes at least one of a contaminant trap for trapping material emanating from the radiation source and a collector for collecting the beam of radiation. The at least one of the contaminant trap and the collector includes an element arranged in the path of the radiation beam on which the material emanating from the radiation source can deposit during propagation of the radiation beam in the radiation system. At least a part of the element disposed in the path of the radiation beam has a surface that has a highly specular grazing incidence reflectivity to reduce the absorption of the radiation beam in a direction of propagation of the radiation beam substantially non-parallel to the surface of the element, so that a thermal load experienced by the element is reduced.

REFERENCES:
patent: 4408338 (1983-10-01), Grobman
patent: 4837794 (1989-06-01), Riordan et al.
patent: 6359969 (2002-03-01), Shmaenok
patent: 6459472 (2002-10-01), De Jager et al.
patent: 6838684 (2005-01-01), Bakker et al.
patent: 7034308 (2006-04-01), Bakker et al.
patent: 7057190 (2006-06-01), Bakker et al.
patent: 7106832 (2006-09-01), Klunder et al.
patent: 7145132 (2006-12-01), Bakker et al.
patent: 2004/0184014 (2004-09-01), Bakker et al.
patent: 2006/0012761 (2006-01-01), Bakker et al.
patent: 2006/0138348 (2006-06-01), Bakker
patent: 2006/0138362 (2006-06-01), Bakker et al.
patent: 2006/0139604 (2006-06-01), Wassink et al.
patent: 2006/0151717 (2006-07-01), Klunder et al.
patent: 2006/0169929 (2006-08-01), Wassink
patent: 2006/0186353 (2006-08-01), Wassink
patent: 2006/0219958 (2006-10-01), Wassink
patent: 2006/0261290 (2006-11-01), Van Herpen et al.
patent: 2007/0018118 (2007-01-01), Sjmaenok et al.
patent: 2007/0023706 (2007-02-01), Sjmaenok et al.
patent: 1 274 287 (2003-01-01), None
patent: 9-320792 (1997-12-01), None
patent: 2000-98098 (2000-04-01), None
patent: 2001-57298 (2001-02-01), None
patent: WO 99/42904 (1999-08-01), None
patent: WO 01/37309 (2001-05-01), None
patent: WO 01/99143 (2001-12-01), None
patent: WO 02/054153 (2002-07-01), None

Affiliated with

Also associated with

Rating

Lithographic apparatus and device manufacturing method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Lithographic apparatus and device manufacturing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic apparatus and device manufacturing method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4048160