Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2005-02-22

2008-03-11

Vanore, David (Department: 2881)

Radiant energy

Inspection of solids or liquids by charged particles

Analyte supports

C250S440110

Reexamination Certificate

active

07342237

ABSTRACT:
A lithographic apparatus comprising: an illumination system for providing a projection beam of radiation; a gas pressure controlled article clamp for clamping an article to be placed in a beam path of the projection beam of radiation; and a pressure circuit for controlling the article clamp, comprising a supply line for connection with the article clamp. According to the invention, a buffer volume is provided for providing a buffered gas pressure pulse in the supply line. In this way, faster clamp response times can be realized.

REFERENCES:
patent: 5191218 (1993-03-01), Mori et al.
patent: 5999589 (1999-12-01), Chiba et al.

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