Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-05-29
2007-05-29
Walke, Amanda (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S311000
Reexamination Certificate
active
10634667
ABSTRACT:
Compositions and techniques for the processing of semiconductor devices are provided. In one aspect of the invention, an antireflective hardmask composition is provided. The composition comprises a fully condensed polyhedral oligosilsesquioxane, {RSiO1.5}n, wherein n equals 8; and at least one chromophore moiety and transparent moiety. In another aspect of the invention, a method for processing a semiconductor device is provided. The method comprises the steps of: providing a material layer on a substrate; forming an antireflective hardmask layer over the material layer. The antireflective hardmask layer comprises a fully condensed polyhedral oligosilsesquioxane, {RSiO1.5}n, wherein n equals 8; and at least one chromophore moiety and transparent moiety.
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Fehere, Frank “Polyhedral Oligosilsesquioxanes and Heterosilsesquoxanes” Separtment of Chemistry, University of California; Copyright 1998 Gelest, Inc., p. 43-49.
Feher, F.J., “Polyhedral Oligosilsesquioxanes and Heterosilsesquioxanes,” Gelest, Inc., pp. 43-59.
Babich Katherina
Mahorowala Arpan P.
Medeiros David R.
Pfeiffer Dirk
International Business Machines - Corporation
Morris, Esq. Daniel P.
Ryan & Mason & Lewis, LLP
Walke Amanda
LandOfFree
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