Arpan P. Mahorowala

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Antireflective hardmask and uses thereof

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate

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Antireflective SiO-containing compositions for hardmask layer

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate

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Etch improved resist systems containing acrylate (or...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate

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Etch selectivity enhancement for tunable etch resistant...

Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state – With decomposition of a precursor
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Hard mask integrated etch process for patterning of silicon...

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask resist contains inorganic material
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Profile ID: LFUS-PAI-P-2203592

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