Liquid crystal display device and method of fabricating the...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Reexamination Certificate

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C438S482000, C438S486000, C438S488000, C438S924000

Reexamination Certificate

active

10875308

ABSTRACT:
There is disclosed a liquid crystal display device and a fabricating method thereof that reduce the number of processes and production cost. A liquid crystal display device and a fabricating method thereof according to an embodiment of the present invention forms a poly-silicon pattern by partially crystallizing an amorphous silicon, and simultaneously etches the amorphous silicon and the poly-silicon pattern, thereby removing the amorphous silicon and leaving the poly-silicon pattern on the substrate.

REFERENCES:
patent: 5952694 (1999-09-01), Miyawaki et al.
patent: 6916693 (2005-07-01), Ohnuma et al.
patent: 6962860 (2005-11-01), Yamazaki et al.
patent: 1088002 (1994-06-01), None
patent: 1501449 (2004-06-01), None

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