Liquid cooled X-ray lithographic exposure apparatus

Details Liquid cooled X-ray lithographic exposure apparatus Liquid cooled X-ray lithographic exposure apparatus

1991-02-20

1991-11-05

Westin, Edward P.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 35, 378208, 355 30, 355 53, 2504431, 357 82, G21K 500, G03B 2752

Patent

active

050635824

ABSTRACT:
The present invention relates to a temperature control system for a lithographic exposure apparatus wherein a mask and wafer are closely disposed, and predetermined exposure energy is applied to respective shot areas of the wafer through the mask. The exposure energy is a soft-X-ray source, for example. The pattern of the mask is transferred onto the respective shot areas in a step-and-repeat manner. In the apparatus, a temperature control medium liquid is supplied into the wafer chuck which supports the wafer at the exposure position. The flow rate of the temperature control liquid is different during an exposure operation than during a non-exposure-operation. The flow control is determined in consideration of the wafer chuck vibration attributable to the supply of the liquid medium and also, of the heat generation in the wafer by the exposure energy, so that the vibration of the wafer chuck during the exposure operation is suppressed. Simultaneously the temperature rise of the wafer can also be suppressed. The pattern transfer from the mask to the wafer thus be precisely performed.

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