Line end spacing measurement

Details Line end spacing measurement Line end spacing measurement

2008-07-01

2008-07-01

Deo, Duy-Vu N (Department: 1792)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S022000, C430S030000

Reexamination Certificate

active

11397464

ABSTRACT:
A method including: providing collinear first and second lines in a mask layer over a substrate, the first line having at one end a first line end and having a first line body adjacent the first line end, and the second line having at one end a second line end and having a second line body adjacent the second line end; measuring line widths of the first line body and the second line body; locating effective line end positions for the first line end based on the line width of the first line body and for the second line end based on the line width of the second line body; and measuring a distance between the effective line end positions, as an effective line end spacing.

REFERENCES:
patent: 4579022 (1986-04-01), Kasai et al.
patent: 5862058 (1999-01-01), Samuels et al.
patent: 6137901 (2000-10-01), Harazaki
patent: 6296977 (2001-10-01), Kaise et al.
patent: 2003/0224252 (2003-12-01), Zhou et al.
patent: 2005/0106473 (2005-05-01), Huang

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