Light-sensitive polymer, method for preparing the same and metho

Details Light-sensitive polymer, method for preparing the same and metho Light-sensitive polymer, method for preparing the same and metho

1992-03-20

1993-10-19

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430270, 430945, G03F 730

Patent

active

052544397

ABSTRACT:
There is disclosed a polymer having linear --Si--O--Si-- bonds and --Si--Si--Si-- bonds, or polysilane bonds that are greater than trisilane bonds, sensitive to far ultraviolet rays. The polymer is prepared by polymerizing a dichlorosiloxane alone or with at least one dichlorosilane in an inert solvent in the presence of sodium. The polymer undergoes oxidation with oxygen plasma to form SiO.sub.2 resistant to oxygen dry etching, exhibits absorption peaks only in far ultraviolet, and is suitable for preparing a single layered resist or an upper resist of a two-layered system.

REFERENCES:
patent: 4761464 (1988-08-01), Zeigler

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