Light-sensitive material and image forming processes using the s

Details Light-sensitive material and image forming processes using the s Light-sensitive material and image forming processes using the s

1982-07-19

1984-02-14

Louie, Jr., Won H.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430326, 430191, 430146, 430147, 430328, 430330, G03C 158

Patent

active

044317255

ABSTRACT:
A light-sensitive material having on a support a light-sensitive layer containing an o-quinonediazide compound as a main component and, additionally, a particular compound represented by the following general formula (I): ##STR1## wherein Z represents the nonmetallic atoms forming a 5-membered ring; X represents S, O, ##STR2## or .dbd.N--R.sub.c (where R.sub.a, R.sub.b and R.sub.c are each a hydrogen atom or an organic group other than a carboxylic acid group); and Y is a hydrogen atom or an organic group other than a carboxylic acid group, is disclosed. This material can provide both positive and negative working images having high resolution and good adhesiveness to the support. A process for producing positive working images includes the steps of imagewise exposure and development processing, while a process for producing negative working images includes the steps of imagewise exposure, heating, uniform (overall) exposure and development processing. The same conditions regarding imagewise exposure and development processing, respectively, can be applied to both processes.

REFERENCES:
patent: 3650756 (1972-03-01), Ohlschlager et al.

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