X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1993-05-20
1994-10-04
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Lithography
378145, G21K 500
Patent
active
053533224
ABSTRACT:
Optimum solutions for three-mirror lenses for projection lithography cameras using X-ray radiation to image a mask on a wafer are represented as single points within regions of two-dimensional magnification space defined by the magnification of a convex mirror as one coordinate and the ratio of the magnifications of a pair of concave mirrors optically on opposite sides of the convex mirror as another coordinate. Lenses within region 30, 50, and preferably within region 40, 60, of such magnification space represent potential solutions that are optimizable by standard computer optical design programs and techniques to achieve extremely low distortion lenses having a resolution of about 0.1 micron or less. Two of these lens systems having large chief ray angles at the mask and chief rays inclined away from the optical axis of the lens system in a direction from the source toward the mask are described in more detail.
REFERENCES:
"Soft X-ray reduction lithography using multilayer mirrors" by H. Kinoshita et al., J. Vac. Sci. Technol. B7(6), Nov./Dec. 1989, pp. 1648-1651.
"Reduction imaging at 14 nm using multilayer-coated optics: Printing of features smaller than 0.1 .mu.m" by J. E. Bjorkholm et al., J. Vac. Sci. Technol. B8(6), Nov./Dec. 1990, pp. 1509-1513.
"High-Precision Soft X-Ray optics", Proceedings of Workshop, Oct. 5-6, 1989, Section on Optical Fabrication, pp. 16-20.
"Design and Analysis of Multimirror Soft-X-Ray Projection Lithography Systems" by D. L. Shealy et al., OSA Proceedings on Soft X-Ray Projection Lithography, 1991, vol. 12, Jeffrey Bokor (ed), Optical Society of America, pp. 22-26.
"Optics Development for Soft X-Ray Projection Lithography Using a Laser Plasma Source" by R. H. Stulen et al., Nov. 15, 1990, OSA Proceedings on Soft-X-Ray Projection Lithography, 1991, vol. 12, Jeffrey Bokor (ed.), Optical Society of America, pp. 54-57.
"Design Survey of X-ray/XUV projection lithography systems" by D. L. Shealy et al., SPIE Advent Technology Series, vol. AT2, Summer/Fall 1990, (ed., Western Washington University), SPIE Optical Engineering Press, pp. 320-331.
"Reflective systems design study for soft X-ray projection lithography" by T. E. Jewell et al., J. Vac. Sci. Technol. B8(6), Nov./Dec. 1990, American Vacuum Society, pp. 1519.1523.
"Step-and-scan lithography using reduction optics" by J. D. Buckley, J. Vac. Sci. Technol. B, vol. 7, No. 6, Nov./Dec. 1989, American Vacuum Society, pp. 1607-1612.
"20:1 Projection Soft-X-ray Lithography Using Tri-level Resist" by T. E. Jewell et al, 1263-34, 5 pages.
"Optical imaging for microfabrication" by J. H. Bruning, J. Vac. Sci. Technol., 17(5), Sep./Oct. 1980, American Vacuum Society, pp. 1147-1155.
"Reflection Mask Technology for X-Ray Projection Lithography", by A. M. Hawryluk et al., presented at 33rd Internaitonal Conference on Electron, Ion and Photon Beam Technology, May 31, 1989; to be published in J. Vac. Sci. Technol., Nov./Dec. 1989, pp. 1-12.
Bruning John H.
Phillips, Jr. Anthony R.
Shafer David R.
White Alan D.
Church Craig E.
Tropel Corporation
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