Optics: measuring and testing – By configuration comparison – With photosensitive film or plate
Patent
1994-02-09
1995-08-08
Evans, F. L.
Optics: measuring and testing
By configuration comparison
With photosensitive film or plate
250548, 355 53, 356401, G01B 1102, G01B 1126
Patent
active
054403944
ABSTRACT:
A length measuring device for performing length measurement and an exposure apparatus for performing an exposure operation on a first object having a plurality of alignment patterns thereon, includes an alignment detector for detecting the relative positional relation between the first object and a second object having a plurality of reference alignment patterns used for aligning the first object therewith, and for detecting an alignment condition between the alignment patterns of the first and second objects, a movement device for moving the first and second objects relative to each other, a measurement device for measuring the amount of movement of the movement device, and a length measurement device for performing measurement of the space between the plurality of alignment patterns formed on the first object. The length measurement device performs length measurement on the basis of successive alignment conditions detected by successive alignment condition detection operations of the alignment detector between the plurality of reference alignment patterns on the second object and the plurality of alignment patterns on the first object, as well as the amount of movement of the movement device measured by the measurement device during the successive alignment condition detection operations of the alignment detector.
REFERENCES:
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patent: 5028797 (1991-07-01), Abe et al.
Patent Abstracts of Japan, vol. 12, No. 293, on English Abstract published Aug. 10, 1988 of Japanese Patent No. 63-70420.
IBM Technical Disclosure Bulletin, H. Herd, et al., Method and Apparatus of In Situ Measurement and Overlay Error Analysis for Correcting Step and Repeat Lithographic Cameras, vol. 26, No. 9, Feb. 1984, pp. 4855-4859.
Patent Abstracts of Japan, vol. 13, No. 198, an English Abstract published May 11, 1989 of Japanese Patent No. 64-19723.
Journal of Vacuum Science & Technology, vol. 16, No. 6, Nov. Dec. 1979, pp. 1954-1958, "Optical Alignment System for Submicron X-Ray Lithography", Fay et al.
Optical Engineereing, vol. 22, No. 2, Mar./Apr. 1983, pp. 203-207, "Application of Zone Plates to Alignment in X-Ray Litography", Feldman et al.
Amemiya Mitsuaki
Nose Noriyuki
Saito Kenji
Canon Kabushiki Kaisha
Evans F. L.
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