Lateral MOSFET with substrate drain connection

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S328000, C257S341000, C257S401000

Reexamination Certificate

active

08039897

ABSTRACT:
In one form a lateral MOSFET includes an active gate positioned laterally between a source region and a drain region, the drain region extending from an upper surface of a monocrystalline semiconductor body to a bottom surface of the monocrystalline semiconductor body, and a non-active gate positioned above the drain region. In another form the lateral MOSFET includes a gate positioned laterally between a source region and a drain region, the drain region extending from an upper surface of a monocrystalline semiconductor body to a bottom surface of the monocrystalline semiconductor body, the source region and the drain region being of a first conductivity type, a heavy body region of a second conductivity type in contact with and below the source region, and the drain region comprising a lightly doped drain (LDD) region proximate an edge of the gate and a sinker extending from the upper surface of the monocrystalline body to the bottom surface of the monocrystalline semiconductor body.

REFERENCES:
patent: 6600182 (2003-07-01), Rumennik
patent: 7282765 (2007-10-01), Xu et al.
patent: 2002/0185705 (2002-12-01), Saitoh et al.
patent: 2003/0089947 (2003-05-01), Kawaguchi et al.
patent: 2003/0201456 (2003-10-01), Saitoh et al.
patent: 2006/0118832 (2006-06-01), Visser et al.
patent: 2007/0114608 (2007-05-01), Letavic
J.C.W. Ng, J.K.O. Sin and L. Guan, “A Novel Planar Power MOSFET With Laterally Uniform Body and Ion-Implanted JFET Region”, Electron Device Letters, IEEE, Apr. 2008, vol. 29, Issue: 4, pp. 375-377, ISSN 0741-3106, current version published Mar. 21, 2008.
International Search Report with Written Opinion in corresponding PCT Application (PCT/US2009/067151), completed Jun. 23, 2010, total 7 pages.

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