Laser removal of layer or coating from a substrate

Details Laser removal of layer or coating from a substrate Laser removal of layer or coating from a substrate

2004-07-08

2009-12-15

Norton, Nadine (Department: 1792)

Etching a substrate: processes

Gas phase etching of substrate

Application of energy to the gaseous etchant or to the...

C216S037000, C134S001100, C134S011000, C134S022170, C427S331000, C427S334000, C427S402000

Reexamination Certificate

active

07632420

ABSTRACT:
A method for treating a substrate having a layer or coating of material thereon (such as for example a metal conductor coated with an insulating ‘enamel’) comprises the steps of directing a pulsed beam of laser radiation at the substrate to cause an interaction or adjacent the interface between the layer or coating and the substrate, leading to local separation of the layer or coating. The removal is effected by creating an interaction effect at the interface between the substrate and the layer or coating to create an effect similar to a shockwave which causes local separation of the layer or coating at the interface.

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Charles Montross, International Journal of Fatigue vol. 24, (2002) 1021-1036.
CN Office Action dated Jul. 24, 2009 from corresponding CN application 200480019423.2.

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