Laser exposure of photosensitive polyimide for pattern formation

Details Laser exposure of photosensitive polyimide for pattern formation Laser exposure of photosensitive polyimide for pattern formation

1992-06-26

1994-12-06

Kight, III, John

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430270, 430945, 522

Patent

active

053709748

ABSTRACT:
A method of patterning a preimidized benzophenone photoactive polymer used as a photoresist with a laser light source improves its crosslinking efficiency and reduces swelling, thereby enabling the formation of lines on the order of microns.

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patent: 5122440 (1992-06-01), Chien

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