Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2011-01-11
2011-01-11
Walke, Amanda C. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S322000, C430S323000, C430S325000, C430S330000, C430S331000, C430S944000, C430S945000, C430S396000, C430S302000
Reexamination Certificate
active
07867688
ABSTRACT:
A method of making micro-structure devices by coating a first layer of resist (12) on a substrate (10). A pattern is created on the substrate by radiation induced thermal removal of the resist.
REFERENCES:
patent: 4675273 (1987-06-01), Woods et al.
patent: 4686168 (1987-08-01), Fujii et al.
patent: 4710445 (1987-12-01), Sanders
patent: 4973572 (1990-11-01), DeBoer
patent: 5145760 (1992-09-01), Blanchet-Fincher et al.
patent: 5359101 (1994-10-01), Woods et al.
patent: 5468591 (1995-11-01), Pearce et al.
patent: 5500059 (1996-03-01), Lund et al.
patent: 5578416 (1996-11-01), Tutt
patent: 5691114 (1997-11-01), Burberry et al.
patent: 5738799 (1998-04-01), Hawkins et al.
patent: 5759741 (1998-06-01), Pearce et al.
patent: 5858607 (1999-01-01), Burberry et al.
patent: 5891602 (1999-04-01), Neuman
patent: 6140025 (2000-10-01), Imai et al.
patent: 6165671 (2000-12-01), Weidner et al.
patent: 6596644 (2003-07-01), Andrews et al.
patent: 6695029 (2004-02-01), Phillips et al.
patent: 6787283 (2004-09-01), Aoai et al.
patent: 7198879 (2007-04-01), Tredwell et al.
patent: 2003/0107111 (2003-06-01), Gluschenkov et al.
patent: 2003/0140490 (2003-07-01), Olson et al.
patent: 2003/0211419 (2003-11-01), Fan
patent: 2003/0211649 (2003-11-01), Hirai et al.
patent: 2004/0256731 (2004-12-01), Mao et al.
patent: 2004/0265492 (2004-12-01), Free et al.
patent: 2005/0074705 (2005-04-01), Toyoda
patent: 2005/0266172 (2005-12-01), Kay et al.
patent: 2006/0068335 (2006-03-01), Coley et al.
patent: 2007/0020530 (2007-01-01), Zientek et al.
patent: 2007/0231541 (2007-10-01), Humpal et al.
patent: 0 343 603 (1989-05-01), None
patent: 0 575 848 (1993-12-01), None
patent: 07056341 (1995-03-01), None
patent: 7-56341 (1995-07-01), None
patent: 08073569 (1996-03-01), None
patent: 2004/039530 (2004-05-01), None
patent: 2005/121893 (2005-12-01), None
Helbert et al.; Radiation Degradation of a-Substituted Acrylate Polymers and Copolymers; Journal of Applied Polymer Science, vol. 21, 1977, pp. 797-807.
Hogan et al.; Laser Photoablation of Spin-on-Glass and Poly(Ethyl Cyanoacrylate) Photoresist; Applied Surface Science 36 (1989), pp. 343-349.
Woods et al.; Vapour deposition of poly(alkyl-2-cyanacrylate) resist coatings: a new electron-beam/deep-ultra-violet photoresist technology, Polymer 1989, vol. 30, pp. 1091-1098.
Nguyen Kelvin
Pearce Glenn T.
Phillips Scott E.
Tredwell Timothy J.
Tutt Lee W.
Blish Nelson A.
Eastman Kodak Company
Tucker J. Lanny
Walke Amanda C.
LandOfFree
Laser ablation resist does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Laser ablation resist, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Laser ablation resist will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2736079