Laser ablated feature formation method

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430396, 430945, 430320, 359201, 359203, 359209, 2191218, B23K 2600

Patent

active

061209767

ABSTRACT:
A method and apparatus for ablating features in a substrate, the apparatus includes a radiation source and first and second rotating transparent uniformly thick disks positioned between the radiation source and a substrate to be irradiated. The method comprises irradiating the substrate with radiation that has passed through the first and second rotating disks, wherein the first and second disks are independently rotating at different angular velocities to create a predetermined irradiation pattern on the substrate. The disks may have a relative acceleration. The method and apparatus may be used to ablate nozzles having longitudinal axes which are non-orthogonal with the surface of the substrate and which are not parallel to each other.

REFERENCES:
patent: 1818410 (1931-08-01), Leventhal
patent: 4118109 (1978-10-01), Crawford et al.
patent: 4733944 (1988-03-01), Fahlen et al.
patent: 4822974 (1989-04-01), Leighton
patent: 4871904 (1989-10-01), Metlitsky et al.
patent: 4923772 (1990-05-01), Kirch et al.
patent: 4940881 (1990-07-01), Sheets
patent: 5263014 (1993-11-01), Kasahara
patent: 5298351 (1994-03-01), Bobroff et al.
patent: 5378137 (1995-01-01), Asakawa et al.
patent: 5411502 (1995-05-01), Zair
patent: 5414559 (1995-05-01), Burghardt et al.
patent: 5526167 (1996-06-01), Peng
patent: 5609778 (1997-03-01), Pulaski et al.
patent: 5610733 (1997-03-01), Feldman et al.
patent: 5742426 (1998-04-01), York
"Diffractive microlenses replicated in fused silica for excimer laser-beam homogenizing", Nikolajeff, et al., Applied Optics, vol. 36, No. 32, pp. 8481-8489, Nov. 10, 1997.
U.S. application No. 09/196,692, Shoemaker et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Laser ablated feature formation method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Laser ablated feature formation method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Laser ablated feature formation method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1071011

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.