Large angle implantation to prevent field turn-on under select g

Details Large angle implantation to prevent field turn-on under select g Large angle implantation to prevent field turn-on under select g

1998-03-16

2000-11-14

Booth, Richard

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having insulated gate

438525, 438298, H01L 218247

Patent

active

061469440

ABSTRACT:
A P-type dopant is implanted into a substrate region 94 under a select drain gate transistor field oxide region 75 at a large tilt angle .alpha., to prevent field turn-on under the select drain gate transistor field oxide region 75 in a non-volatile memory device such as a NAND flash memory device. A substrate region 114 under a select source gate transistor field oxide region 77 can also be implanted with a P-type dopant to prevent field turn-on under the region 77 if select source gates 90 and 92 are to be supplied with a voltage in operation rather than grounded. The substrate regions 94 and 114 under both the select drain gate transistor field oxide region 75 and the select source gate transistor field oxide region 77 can be implanted with the P-type dopant using a fixed-angle ion beam 120, by rotating the wafer 124 between the step of implanting one of the substrate regions and the step of implanting the other region.

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