Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2009-03-12
2010-11-16
Chu, John S (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S273100, C430S296000, C430S326000, C430S330000, C430S907000, C430S910000, C526S256000, C526S257000, C526S282000, C549S045000, C549S300000, C560S220000
Reexamination Certificate
active
07833694
ABSTRACT:
Lactone-containing compounds having formula (1) are novel wherein R1is H, F, methyl or trifluoromethyl, R2and R3are H or monovalent hydrocarbon groups, or R2and R3may together form an aliphatic hydrocarbon ring, R4is H or CO2R5, R5is a monovalent hydrocarbon group, W is CH2, O or S, and k1is 3, 4 or 5. They are useful as monomers to produce polymers which are transparent to radiation ≦500 nm. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit excellent properties including resolution, LER, pattern density dependency and exposure margin.
REFERENCES:
patent: 6280898 (2001-08-01), Hasegawa et al.
patent: 6312867 (2001-11-01), Kinsho et al.
patent: 6329125 (2001-12-01), Takechi et al.
patent: 6448420 (2002-09-01), Kinsho et al.
patent: 6830866 (2004-12-01), Kobayashi et al.
patent: 2005/0048402 (2005-03-01), Mizutani et al.
patent: 2005/0227174 (2005-10-01), Hatakeyama et al.
patent: 2005/0260525 (2005-11-01), Takemoto et al.
patent: 2007/0128555 (2007-06-01), Harada et al.
patent: 2007/0160929 (2007-07-01), Hasegawa et al.
patent: 2007/0218401 (2007-09-01), Ando et al.
patent: 2008/0026331 (2008-01-01), Hasegawa et al.
patent: 2008/0090173 (2008-04-01), Harada et al.
patent: 2009/0023878 (2009-01-01), Maeda et al.
patent: 4-39665 (1992-02-01), None
patent: 9-90637 (1997-04-01), None
patent: 2000-26446 (2000-01-01), None
patent: 2000-159758 (2000-06-01), None
patent: 2000-327633 (2000-11-01), None
patent: 2000-336121 (2000-12-01), None
patent: 2001-188346 (2001-07-01), None
patent: 2002-169289 (2002-06-01), None
patent: 2003-66612 (2003-03-01), None
patent: 2005-321785 (2005-11-01), None
patent: 2005-352466 (2005-12-01), None
patent: 2006-1102 (2006-01-01), None
patent: 2007-153982 (2007-06-01), None
patent: 2007-249192 (2007-09-01), None
patent: 2008-31298 (2008-02-01), None
patent: 2008-43501 (2008-02-01), None
patent: 200888343 (2008-04-01), None
patent: 2009/107327 (2009-09-01), None
Koji Arimitsu et al., “Sensitivity Enhancement of Chemical-Amplification-Type Photoimaging Materials by Acetoacetic Acid Derivatives”, Journal of Photopolymer Science and Technology, vol. 8, No. 1, pp. 43-44 (1995).
Kazuaki Kudo et al., “Enhancement of the Senesitivity of Chemical-Amplification-Type Photoimaging Materials by β-Tosyloxyketone Acetals”, Journal of Photopolymer Science and Technology, vol. 8, No. 1, pp. 45-46 (1995).
Koji Arimitsu et al., “Effect of Phenolic Hydroxyl Residues on the Improvement of Acid-Proliferation-Type Photoimaging Materials”, Journal of Photopolymer Science and Technology, vol. 9, No. 1, pp. 29-30, (1996).
M. Maenhoudt et al., Double Patterning scheme for sub-0.25 k1 single damascene structures at NA=0.75, λ=193nm, Proceedings of SPIE, vol. 5754, pp. 1508, (2005).
Masato Shibuya et al., “Performance of Resolution Enhancement Technique Using Both Multiple Exposure and Nonlinear Resist”, Jpn. J. Phys. vol. 33, 6874-6877, (1994).
Search Report mailed Jun. 8, 2009 in connection with corresponding European Application No. 09003396.0.
Hasegawa Koji
Kinsho Takeshi
Kobayashi Katsuhiro
Nishi Tsunehiro
Shinachi Satoshi
Birch & Stewart Kolasch & Birch, LLP
Chu John S
Shin-Etsu Chemical Co. , Ltd.
LandOfFree
Lactone-containing compound, polymer, resist composition,... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Lactone-containing compound, polymer, resist composition,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lactone-containing compound, polymer, resist composition,... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4252415