Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2011-01-18
2011-01-18
Chu, John S (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S326000, C430S330000, C430S910000
Reexamination Certificate
active
07871752
ABSTRACT:
Lactone-containing compounds having formula (1) are novel wherein R1is H, F, methyl or trifluoromethyl, R2and R3are monovalent hydrocarbon groups, or R2and R3may together form an aliphatic hydrocarbon ring, R4is H or CO2R5, R5is a monovalent hydrocarbon group, W is CH2, O or S, and k1is 0 or 1. They are useful as monomers to produce polymers which are transparent to radiation≦500 nm. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit excellent properties including resolution, pattern edge roughness, pattern density dependency and exposure margin.
REFERENCES:
patent: 6280898 (2001-08-01), Noda et al.
patent: 6312867 (2001-11-01), Kinsho et al.
patent: 6329125 (2001-12-01), Takechi et al.
patent: 6448420 (2002-09-01), Kinsho et al.
patent: 6787282 (2004-09-01), Sato
patent: 6824956 (2004-11-01), Sato
patent: 6830866 (2004-12-01), Kobayashi et al.
patent: 7179579 (2007-02-01), Uenishi
patent: 7186495 (2007-03-01), Maeda et al.
patent: 2004/0259028 (2004-12-01), Sato
patent: 2005/0048402 (2005-03-01), Mizutani et al.
patent: 2005/0233242 (2005-10-01), Yamanaka
patent: 2006/0046190 (2006-03-01), Sato
patent: 2007/0148594 (2007-06-01), Funatsu et al.
patent: 2007/0160929 (2007-07-01), Hasegawa et al.
patent: 2009/0233242 (2009-09-01), Hasegawa et al.
patent: 2009/0274984 (2009-11-01), Shinachi et al.
patent: 4-39665 (1992-02-01), None
patent: 9-90637 (1997-04-01), None
patent: 2000-26446 (2000-01-01), None
patent: 2000-159758 (2000-06-01), None
patent: 2000-327633 (2000-11-01), None
patent: 2000-336121 (2000-12-01), None
patent: 2003015296 (2003-01-01), None
patent: 2003-66612 (2003-03-01), None
patent: 2003149812 (2003-05-01), None
patent: 2006-1102 (2006-01-01), None
Koji Arimitsu et. al., “Sensitivity Enhancement of Chemical- Amplification-Type Photoimaging Materials by Acetoacetic Acid Derivatives,” Journal of Photopolymer Science and Technology, vol. 8, No. 1(1995), pp. 43-44, Published by the Technical Association of Photopolymers Japan.
Kazuaki Kudo et al., “Enhancement of the Senesitivity of Chemical-Amplification-Type Photoimaging Materials by β-Tosyloxyketone Acetals,” Journal of Photopolymer Science and Technology, vol. 8, No. 1(1995), pp. 45-46.
Koji Arimitsu et al., “Effect of Phenolic Hydroxyl Residues on the Improvement of Acid-Proliferation-Type Photoimaging Materials,” Journal of Photopolymer Science and Technology, vol. 9, No. 1(1996), pp. 29-30.
Hasegawa Koji
Kinsho Takeshi
Nishi Tsunehiro
Tachibana Seiichiro
Birch & Stewart Kolasch & Birch, LLP
Chu John S
Shin-Etsu Chemical Co. , Ltd.
LandOfFree
Lactone-containing compound, polymer, resist composition,... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Lactone-containing compound, polymer, resist composition,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lactone-containing compound, polymer, resist composition,... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2712131