Isolation trench with rounded corners for BiCMOS process

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Reexamination Certificate

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Details

C438S234000, C438S294000, C438S296000, C438S700000, C257SE21540, C257SE21642, C257SE21696

Reexamination Certificate

active

07846789

ABSTRACT:
A semiconductor device comprising a first transistor device on or in a semiconductor substrate and a second transistor device on or in the substrate. The device further comprises an insulating trench located between the first transistor device and the second transistor device. At least one upper corner of the insulating trench is a rounded corner in a lateral plane of the substrate.

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Parthasarathy, V, et al., “A multi trench analog+logic protection (M-TRAP) for substrate crosstalk prevention in a 0.25/spi mu/m smart power platform with 100V high-side capability,” Power Semiconductor Devices and ICs, 2004 Proceedings, ISPSD apos;04, the 16th International Symposium, May 24-27, 2004, pp. 427-430.

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