Iso/nested cascading trim control with model feedback updates

Details Iso/nested cascading trim control with model feedback updates Iso/nested cascading trim control with model feedback updates

2007-04-24

2007-04-24

Bahta, Kidest (Department: 2125)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

73

Reexamination Certificate

active

10944463

ABSTRACT:
This method includes a method for etch processing that allows the bias between isolated and nested structures/features to be adjusted, correcting for a process wherein the isolated structures/features need to be smaller than the nested structures/features and wherein the nested structures/features need to be reduced relative to the isolated structures/features, while allowing for the critical control of trimming.

REFERENCES:
patent: 5946079 (1999-08-01), Borodovsky
patent: 6297166 (2001-10-01), Horak et al.
patent: 6884734 (2005-04-01), Buehrer et al.
patent: 2001/0031506 (2001-10-01), Plat et al.
patent: 2003/0228532 (2003-12-01), Mui et al.
patent: 2004/0185583 (2004-09-01), Tomoyasu et al.
M. Nagase et al., “Accurate Gate CD Control for 130nm CMOS Technology Node,” Conf. Proc., 2003 IEEE Int'l Symp. Semiconductor Manufacturing, pp. 183-186, (Sep. 30, 2003).
Masatoshi Nagase et al., “Advanced Gate Etching for Accurate CD Control for 130-nm Node ASIC Manufacturing,” IEEE Transactions on Semiconductor Manufacturing, vol. 17 (No. 3), pp. 281-285, (Aug. 2004).
Wesley C. Natzle et al., “Trimming of Hard-masks by Gaseous Chemical Oxide Removal (COR) for Sub-10nm Gates/Fins, for Gate Length Control and for Embedded Logic,” ASMC '04, IEEE Conference and Workshop, p. 61-65, (May 4, 2004).
Mitsugu Tajima et al., “Advanced Process Control for 40nm Gate Fabrication,” Conf. Proc., IEEE Int'l Symp. Semiconductor Manufacturing, p. 115-118, (Sep. 30, 2003).

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