Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1984-04-02
1987-09-15
Moore, David K.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
31511191, 31511131, 31511181, H02K 3900
Patent
active
046942220
ABSTRACT:
An ion plasma electron gun for the generation of large area electron beams with uniform electron distribution. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid into a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode causing the cathode to emit secondary electrons which form an electron beam. After passing through the extraction grid and the plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and a uniform electron distribution which is substantially the same as the ion distribution of the ion beam impinging upon the cathode. Control of the generated electron beam is achieved by applying a control voltage between the wire and the grounded housing of the plasma chamber to control the density of positive ions bombarding the cathode.
REFERENCES:
patent: 3243570 (1966-03-01), Boring
patent: 3411035 (1968-11-01), Necker et al.
patent: 3866089 (1975-02-01), Hengartner
patent: 3903891 (1975-09-01), Brayshaw
patent: 3970892 (1976-07-01), Wakalopulos
patent: 4061944 (1977-12-01), Gay
patent: 4359667 (1982-11-01), Paterson et al.
Zakharchenko et al., "A Stabilisation Unit for a Cold Cathode Glow Discharge Electron-Beam Gun", Auto. Weld. (GB), vol. 28, No. 12, pp. 56-58, Dec. 1975.
Bayless et al., "The Plasma-Cathode Electron Gun", IEEE Jour. Quantum Electronics, vol. QE-10, No. 2, pp. 213-218, Feb. 1974.
Moore David K.
RPC Industries
Wittenberg Malcolm B.
LandOfFree
Ion plasma electron gun does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Ion plasma electron gun, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ion plasma electron gun will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1387776