Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate
2005-06-21
2005-06-21
Lee, John R. (Department: 2881)
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
C250S492220, C250S492230, C250S492200, C250S492100, C250S492300, C250S3960ML, C250S3960ML, C250S398000, C430S030000
Reexamination Certificate
active
06909103
ABSTRACT:
A particle-beam exposure apparatus (1) for irradiating a target (41) by means of a beam (2) of energetic electrically charged particles comprises: an illumination system (101) for generating and forming said particles into a directed beam (21); a pattern definition means (102) located after the illumination system for positioning a pattern of apertures transparent to the particles in the path of the directed beam, thus forming a patterned beam (22) emerging from the pattern definition means through the apertures; and a projection system (103) positioned after the pattern definition means (102) for projecting the patterned beam (22) onto a target (41) positioned after the projection system. The apparatus further comprises an acceleration/deceleration means (32) containing an electric potential gradient which is oriented substantially parallel to the path of the structured beam and constant over at least a cross-section of the beam.
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Loeschner Hans
Platzgummer Elmar
Stengl Gerhard
IMS-Ionen Mikrofabrikations Systeme GmbH
Lee John R.
Maenner Joseph E.
Monte & McGraw, P.C.
Souw Bernard E.
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