Radiant energy
With charged particle beam deflection or focussing
Magnetic lens
Inventor
active
Arrangement for masked beam lithography by means of electrically
Arrangement for shadow-casting lithography
Ion irradiation of a target at very high and very low...
Maskless particle-beam system for exposing a pattern on a...
Particle-optical imaging system for lithography purposes
No associations
LandOfFree
Hans Loeschner does not yet have a rating. At this time, there are no reviews or comments for this inventor.
If you have personal experience with Hans Loeschner, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Hans Loeschner will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-P-516293