Ion implanter

Details Ion implanter Ion implanter

2007-10-10

2009-12-22

Wells, Nikita (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S42300F, C250S3960ML, C250S397000, C250S281000, C250S294000, C250S298000, C250S299000

Reexamination Certificate

active

07635850

ABSTRACT:
An analyzing electromagnet constituting an ion implanter has a first inner coil, a second inner coil, three first outer coils, three second outer coils, and a yoke. The inner coils are saddle-shaped coils cooperating with each other to generate a main magnetic field which bends an ion beam in the X direction. Each of the outer coils is a saddle-shaped coil which generates a sub-magnetic field correcting the main magnetic field. Each of the coils has a configuration where a notched portion is disposed in a fan-shaped cylindrical stacked coil configured by: winding a laminations of an insulation sheet and a conductor sheet in multiple turn on an outer peripheral face of a laminated insulator; and forming a laminated insulator on an outer peripheral face.

REFERENCES:
patent: 7326941 (2008-02-01), Chen et al.
patent: 2008/0135753 (2008-06-01), Yamashita et al.
patent: 2004-152557 (2004-05-01), None
patent: 2005-327713 (2005-11-01), None

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