Ion generating source for use in an ion implanter

Details Ion generating source for use in an ion implanter Ion generating source for use in an ion implanter

1994-11-15

1996-03-05

Berman, Jack I.

Radiant energy

Ion generation

Electron bombardment type

250423R, 25044221, H01J 3708

Patent

active

054970067

ABSTRACT:
An ion source embodying the present invention is for use in an ion implanter. The ion source comprises a gas confinement chamber having conductive chamber walls that bound a gas ionization zone. The gas confinement chamber includes an exit opening to allow ions to exit the chamber. A base positions the gas confinement chamber relative to structure for forming an ion beam from ions exiting the gas confinement chamber. A gas supply is in communication with the gas confinement chamber for conducting an ionizable gas into the gas confinement chamber. A cathode is supported by the base and positioned with respect to said gas confinement chamber to emit ionizing electrons into the gas ionization zone. The cathode comprises a tubular conductive body that partially extends into the gas confinement chamber and includes a conductive cap that faces into the gas confinement chamber for emitting ionizing electrons into the gas confinement chamber. A filament is supported by the base at a position inside the tubular conductive body of the cathode for heating the cap and cause the ionizing electrons to be emitted from the cap into the gas confinement chamber.

REFERENCES:
patent: 4017403 (1977-04-01), Freeman
patent: 4506160 (1985-05-01), Sugawara et al.
patent: 4578589 (1986-03-01), Altken
patent: 4641031 (1987-02-01), Ito et al.
patent: 4754200 (1988-06-01), Plumb et al.
patent: 5262652 (1993-11-01), Bright et al.
Kirchner et al., Nuclear Instruments and Methods, vol. 127, No. 2, Aug. 1975, pp. 307-309.

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