Ion beam processing method

Details Ion beam processing method Ion beam processing method

2008-01-29

2008-01-29

Berman, Jack I. (Department: 2881)

Radiant energy

Inspection of solids or liquids by charged particles

Positive ion probe or microscope type

C250S491100, C250S492210

Reexamination Certificate

active

10543843

ABSTRACT:
When scanning by an ion beam in advance an area24including a reference hole23formed at a position other than the area to be processed25of a light-shielding film21on a glass substrate22, a secondary ion signal of the same atom as the incident ions injected into the substrate is detected instead of detecting the secondary ion signal of the atoms included in the base film, and the position23of the hole is stored. Then, the area24including the hole formed during the processing is scanned and the secondary ion signal of the same atom as the incident ions is detected to determine the current position26of the hole, the position of the hole obtained by the previous detection and the current position of the hole are compared, and the amount of shift of the position of the hole is determined. This shifted amount is regarded as the drift amount.

REFERENCES:
patent: 6740456 (2004-05-01), Kanamitsu
patent: 7018683 (2006-03-01), Takaoka et al.
patent: 63305358 (1988-12-01), None
patent: 2000021347 (2000-01-01), None

Affiliated with

Also associated with

Rating

Ion beam processing method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Ion beam processing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ion beam processing method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3927813