Ion beam apparatus and sample processing method

Radiant energy – Inspection of solids or liquids by charged particles – Positive ion probe or microscope type

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C250S492210

Reexamination Certificate

active

07084399

ABSTRACT:
For the sake of realizing high throughput and high processing position accuracy in an ion beam apparatus, two kinds of ion beams for processing are prepared of which one is a focusing ion beam for high image resolution and an edge processing ion beam of large beam current for permitting a sectional edge portion to be processed sharply, whereby high processing position accuracy can be ensured even with a large current ion beam.

REFERENCES:
patent: 4336597 (1982-06-01), Okubo et al.
patent: 4503329 (1985-03-01), Yamaguchi et al.
patent: 4567369 (1986-01-01), Smith et al.
patent: 4618766 (1986-10-01), van der Mast et al.
patent: 4683378 (1987-07-01), Shimase et al.
patent: 4725722 (1988-02-01), Maeda et al.
patent: 5061851 (1991-10-01), Noguchi
patent: 5120925 (1992-06-01), Ohnishi et al.
patent: 5146090 (1992-09-01), Plies
patent: 5270552 (1993-12-01), Ohnishi et al.
patent: 5300776 (1994-04-01), Krivanek
patent: 5825035 (1998-10-01), Mizumura et al.
patent: 5852297 (1998-12-01), Ishitani et al.
patent: 6067164 (2000-05-01), Onoguchi et al.
patent: 6259960 (2001-07-01), Inokuchi
patent: 6452175 (2002-09-01), Adamec
patent: 6583426 (2003-06-01), Kawanami et al.
patent: 2002/0017619 (2002-02-01), Hirose et al.
patent: 2-061954 (1990-03-01), None
patent: 406097054 (1994-04-01), None
patent: 9-186138 (1997-07-01), None
patent: 2-708547 (1997-10-01), None
patent: 2-765829 (1998-04-01), None
patent: 2-774884 (1998-04-01), None
patent: 10-283971 (1998-10-01), None
patent: 11-258130 (1999-09-01), None
patent: WO 9913500 (1999-03-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Ion beam apparatus and sample processing method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Ion beam apparatus and sample processing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ion beam apparatus and sample processing method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3624633

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.