Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2011-08-09
2011-08-09
Richards, N Drew (Department: 2895)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S314000, C257S315000, C257S318000, C257SE29300, C257SE21422, C257SE21662, C257SE21679, C257SE29309, C438S211000, C438S257000, C438S593000
Reexamination Certificate
active
07994588
ABSTRACT:
Example embodiments provide a nonvolatile memory device that may be integrated through stacking, a stack module, and a method of fabricating the nonvolatile memory device. In the nonvolatile memory device according to example embodiments, at least one bottom gate electrode may be formed on a substrate. At least one charge storage layer may be formed on the at least one bottom gate electrode, and at least one semiconductor channel layer may be formed on the at least one charge storage layer.
REFERENCES:
patent: 6285055 (2001-09-01), Gosain et al.
patent: 2001/0030324 (2001-10-01), Morikawa et al.
patent: 2006/0043377 (2006-03-01), Hoffman et al.
Kim Sun-Il
Park Young-soo
Yin Huaxiang
Harness & Dickey & Pierce P.L.C.
Richards N Drew
Samsung Electronics Co,. Ltd.
Sun Yu-Hsi
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