Inverted nonvolatile memory device, stack module, and method...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S314000, C257S315000, C257S318000, C257SE29300, C257SE21422, C257SE21662, C257SE21679, C257SE29309, C438S211000, C438S257000, C438S593000

Reexamination Certificate

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07994588

ABSTRACT:
Example embodiments provide a nonvolatile memory device that may be integrated through stacking, a stack module, and a method of fabricating the nonvolatile memory device. In the nonvolatile memory device according to example embodiments, at least one bottom gate electrode may be formed on a substrate. At least one charge storage layer may be formed on the at least one bottom gate electrode, and at least one semiconductor channel layer may be formed on the at least one charge storage layer.

REFERENCES:
patent: 6285055 (2001-09-01), Gosain et al.
patent: 2001/0030324 (2001-10-01), Morikawa et al.
patent: 2006/0043377 (2006-03-01), Hoffman et al.

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