Intermediate layer composition for three-layer resist...

Details Intermediate layer composition for three-layer resist... Intermediate layer composition for three-layer resist...

2005-04-26

2005-04-26

McPherson, John A. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

C430S272100, C430S270100, C430S330000, C525S474000, C525S477000

Reexamination Certificate

active

06884571

ABSTRACT:
An intermediate layer composition for a three-layer resist process comprising (A) an octakis(silsesquioxane) skeleton-containing polymer obtained by hydrosilylation polymerization of a compound represented by formula (I) defined in the specification with bis(substituted ethynyl) compound in the presence of a platinum-containing catalyst.

REFERENCES:
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patent: 2573371 (1996-10-01), None
patent: 2641644 (1997-05-01), None
patent: 2901044 (1999-03-01), None

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