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Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface

Reexamination Certificate

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C430S007000, C359S891000, C349S108000

Reexamination Certificate

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07632629

ABSTRACT:
A pattern structure of at least two different layer system elements disposed adjacent one beside the other upon a carrier substrate, at least one of said layer system elements comprises a layer of dielectric material, the layer of dielectric material residing upon a layer of a material that is resistant to activated oxygen or activated water and having a second surface facing toward the substrate. The dielectric layer of the one layer system element forms a disturbed region between the adjacent layer system elements, the dielectric layer having a thickness of d5and wherein the disturbed region has a width of at most 10*d5.

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patent: 5510215 (1996-04-01), Prince et al.
patent: 5726805 (1998-03-01), Kaushik et al.
patent: 5915051 (1999-06-01), Damask et al.
patent: 6087050 (2000-07-01), Itano et al.
patent: 6879450 (2005-04-01), Edlingger et al.
Research Discosure 336091 A, “Mfg. multilayer dielectric masks for laser etching by using lift-off technique in which polymer can be etched away cayyring parts of dielectric film with it”, Apr. 10, 1992, Derwent-Acc-No. 1992-164617.

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