Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2007-02-13
2007-02-13
Chaudhari, Chandra (Department: 2891)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C438S596000, C257SE21691
Reexamination Certificate
active
11007138
ABSTRACT:
Field-effect transistors, select gates, and select lines have first and second conductive layers separated by an interlayer dielectric layer. A conductive strap is disposed on either side of the first and second conductive layers. Each strap electrically interconnects the first and second conductive layers.
REFERENCES:
patent: 6187636 (2001-02-01), Jeong
patent: 6261907 (2001-07-01), Chang
patent: 6777294 (2004-08-01), Park
Helm Mark A.
Violette Michael
Chaudhari Chandra
Leffert Jay & Polglaze P.A.
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