Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging
Patent
1998-02-24
2000-06-27
Bowers, Charles
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Electron beam imaging
430311, 430942, 427551, 427552, 427553, G03F 740
Patent
active
060805269
ABSTRACT:
A process for the preparation of substrates used in the manufacture of integrated circuits wherein spin-on low dielectric constant (low-k) polymer films are applied on semiconductor substrates. A non-etchback processing of spin-on low-k polymer films, without losing the low dielectric constant feature of the film, especially in between metal lines, is achieved utilizing electron beam radiation. A polymeric dielectric film is applied and dried onto a substrate and exposed to electron beam radiation under conditions sufficient to partially cure the dielectric layer. The exposing forms a relatively more hardened topmost portion of the dielectric layer and a relatively less hardened underlying portion of the dielectric layer.
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Choi Dong Kyu
Forester Lynn
Hendricks Neil H.
Wang Shi-Qing
Yang Jingjun
Allied-Signal Inc.
Bowers Charles
Criss Roger H.
Hullinger Robert
Weise Leslie A.
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