Integrated stepwise statistical process control in a plasma...

Data processing: measuring – calibrating – or testing – Testing system – Of circuit

Reexamination Certificate

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Reexamination Certificate

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07469195

ABSTRACT:
An automated process control system for controlling a plasma processing system having a chamber, for processing a substrate is disclosed. The automatic process control system includes a first sensor disposed within the chamber, for making a first plurality of measurements pertaining to a first parameter associated with a structure disposed at least partially within the chamber. The automatic process control system further includes first logic coupled to receive the first plurality of measurements from the first sensor. The first logic is configured for analyzing the first plurality of measurements during a test step. There is also included second logic coupled to receive a first signal from the first logic, the second logic being configured to stop the test step if the first signal indicates a fault.

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