Integrated low-k hard mask

Details Integrated low-k hard mask Integrated low-k hard mask

2005-12-13

2005-12-13

Whitehead, Jr., Carl (Department: 2813)

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

C438S622000, C438S624000, C438S700000

Reexamination Certificate

active

06974772

ABSTRACT:
Embodiments of the invention provide a device with a hard mask layer between first and second ILD layers. The hard mask layer may have a k value approximately equal to the first and/or second ILD layers.

REFERENCES:
patent: 2003/0113995 (2003-06-01), Xia et al.
patent: 2003/0134495 (2003-07-01), Gates et al.

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