Integrated circuit with improved RC delay

Details Integrated circuit with improved RC delay Integrated circuit with improved RC delay

2006-03-28

2006-03-28

Nguyen, Tuan H. (Department: 2813)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

C438S622000

Reexamination Certificate

active

07018942

ABSTRACT:
In one embodiment, a passivation level includes a low-k dielectric. The low-k dielectric helps lower the capacitance of a metal line in a last metal level, which may be just below the passivation level. In another embodiment, the metal line is relatively thick. This helps lower the metal line's resistance and resulting RC delay.

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