Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1996-08-22
1998-11-24
Ngo, Ngan V.
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
257398, 257399, 257400, H01L 29788, H01L 2976, H01L 2994
Patent
active
058411631
ABSTRACT:
An integrated circuit memory device includes a semiconductor substrate having a memory cell area and a select transistor area. A first field insulation layer is included in the memory cell area, and a first channel stop impurity layer is included beneath the first field insulation layer. The first channel stop impurity layer is narrower than the first field insulation area. A second field insulation layer is included in the select transistor area, and a second channel stop impurity layer is included beneath the second field insulation layer. The second channel stop impurity layer is wider than the second field insulation layer. Integrated circuit memory devices are fabricated by defining a memory cell area and a select transistor area of a semiconductor substrate. The memory cell area includes a memory cell active area and a memory cell field area. The select transistor area includes a select transistor active area and a select transistor field area. First channel stop impurity ions are implanted into the select transistor field area. A first field insulation layer is formed in the memory cell field area, and a second field insulation layer is formed in the select transistor field area, such that the first channel stop impurity ions lie beneath the second field insulation area. Second channel stop impurity ions are implanted through the central portion of the first field insulation area, such that the second channel stop impurity ions lie beneath the central portion of the first field insulation layer.
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patent: 5568418 (1996-10-01), Crisenza et al.
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Choi Jeong-hyuk
Joo Kyung-joong
Ngo Ngan V.
Samsung Electronics Co,. Ltd.
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