Integrated circuit having a multi-layer interconnection structur

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365182, G11C 1140

Patent

active

044596871

ABSTRACT:
An integrated circuit having a multi-layer interconnection structure comprises a logic section of series-connected MOS FETs each having a gate input connection layer made of a polysilicon layer on a semiconductor substrate of one conductivity type and source and drain semiconductor regions of the other conductivity type formed in the surface of the substrate along such a direction as to traverse the gate input connection layer, a load device connected to one end of the logic section, and interconnection structure for causing a signal, at a junction of the load device and logic the section, to be transmitted to the other end of the logic section across the gate input connection layer.

REFERENCES:
patent: 4417329 (1983-11-01), Mezawa et al.

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